Filter material PTFE mask membrane manufacturer selection



The polytetrafluoroethylene mask membrane has high-density micropores, which is refreshing and breathable. The film has the excellent characteristics of micropores, hydrophobicity …

The polytetrafluoroethylene mask membrane has high-density micropores, which is refreshing and breathable. The film has the excellent characteristics of micropores, hydrophobicity and non-moisture absorption. Water vapor is not easy to accumulate, and it can quickly wick away moisture, keeping it fresh and breathable for a long time.

Due to the different materials of masks, the effects are also different. Non-woven fabrics and ordinary cotton fabrics will attenuate with filtration time, while masks made of ptfe film material are long-lasting and stable, can be self-cleaned, have the same resistance, and filter It is also more efficient than ordinary masks.

?Environmentally friendly filter material polytetrafluoroethylene mask membrane has a significant effect in purifying the air.

The product is made by mechanically stretching PTFE material, which can ensure the complete interception of impurities such as bacteria and has a large flux.

The material is resistant to high temperatures, strong acids and alkalis, and has wide chemical applicability. When used for gas filtration, it can achieve 100% retention of various phages, bacteria and particles above 0.02um.

Therefore, the microporous membrane has good waterproof properties and good breathability, so it is very suitable for waterproof, dustproof and breathable applications.

? is a manufacturer specializing in the production of membrane materials and various membrane-coated filter materials. Our membrane materials are all imported raw materials, with a full set of domestic advanced production equipment and advanced production technology. Our products have passed ISO9001 quality management system Certification and testing standards strictly follow the EU standard EN1822, and membrane products are tested using the MPPS method.

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Author: clsrich

 
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